@article{oai:cis.repo.nii.ac.jp:00000056,
 author = {亀井, 翼 and 坂本, 尚史 and カメイ, タスク and サカモト, タカブミ and KAMEI, Tasuku and SAKAMOTO, Takabumi},
 journal = {千葉科学大学紀要},
 month = {Feb},
 note = {P(論文), A series of simple and practical kinetic equations were developed based on a sequential first-order parallel reaction model for the prediction of total organic halogen (TOX), trihalomethanes (THMs) formation and residual chlorine decay. In place of the determination of the actual reactive sites in the precursors, the concept of prospective reactive sites of precursors expressed in terms of TOX and THMs concentration was incorporated into the sequential first-order parallel reaction model. These prospective reactive sites of precursors were categorized into three groups according to the difference of TOX , THMs formation rate or chlorine decay rate, and their concentration were successfully expressed as a function of UV absorbance at 260 nm (E260) and chlorine dose. The concentration of TOX , THMs, and residual chlorine predicted by the proposed model were found to be in reasonable agreement with the observed data obtained by the use of different types of natural water samples. As TOX, THMs, and residual chlorine levels at any contact time can be easily predicted by this model using just only E260, chlorine dose, and temperature, this model may be used for the simple management of chlorination process.},
 pages = {107--121},
 title = {Prediction of Total organic halogen (TOX) Trihalomethanes (THMs) Formation and Residual Chlorine Decay by Sequential First-Order Parallel Reaction Model},
 volume = {3},
 year = {2010}
}